Dr Kaivan Karami
- Affiliate (School of Engineering)
Publications
2024
Paul, J. et al. (2024) Niobium Quantum Devices: From Fabrication to Measurement. Superconducting Quantum Devices in the UK 2024, London, UK, 18 Jun 2024.
Paul, J. et al. (2024) Development of Superconducting Qubit and Circuit-Components for Advanced Quantum Technologies. Seminar at the National Physical Laboratory, London, UK, 01 Feb 2024.
2023
Paul, J. et al. (2023) Scalable and CMOS-Compatible Superconducting Qubit Fabrication Process for Quantum Computing Applications. Superconducting Qubits and Algorithms Conference (SQA), Munich, Germany, 29 Aug - 01 Sep 2023.
Dhongde, A., Ofiare, A., Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2023)
Buffer-Free GaN-on-SiC HEMTs with Bond Pad Heat Sinks.
UK Semiconductors 2023, Sheffield, UK, 12-13 July 2023.
(Accepted for Publication)
Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Dhongde, Aniket, Cheng, Huihua, Reynolds, Paul M.
ORCID: https://orcid.org/0000-0001-7614-0008, Reddy, Bojja Aditya, Ritter, Daniel, Li, Chong
ORCID: https://orcid.org/0000-0001-5654-0039, Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X and Thoms, Stephen
ORCID: https://orcid.org/0000-0001-7820-6023
(2023)
Robust sub-100 nm T-Gate fabrication process using multi-step development.
Micro and Nano Engineering, 19,
100211.
(doi: 10.1016/j.mne.2023.100211)
Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Hassan, S., Taking, S., Ofiare, A., Dhongde, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2023)
Comparative Study of Al2O3 and HfO2 as gate dielectric on AlGaN/GaN MOSHEMTs.
International Journal of Electronics and Communication Engineering, 17(2),
pp. 47-50.
2022
Dhongde, Aniket, Taking, Sanna, Ofiare, Afesomeh, Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Elksne, Maira, Dwidar, Mahmud, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
DC and RF Characteristics of Buffer-Free AlGaN/GaN HEMT and MIS-HEMTs Using Si3N4 Passivated Mesa-Sidewall.
In: International Conference on Electronic and Photonic Integrated Circuits (EPIC- 2022), Andhra Pradesh, India, 15-17 Dec 2022,
(Accepted for Publication)
Cheng, Huihua, Dhongde, Aniket, Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Reynolds, Paul
ORCID: https://orcid.org/0000-0001-7614-0008, Thoms, Stephen
ORCID: https://orcid.org/0000-0001-7820-6023, Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X and Li, Chong
ORCID: https://orcid.org/0000-0001-5654-0039
(2022)
Reliable T-gate Process for THz HEMTs.
UK Semiconductors 2022, Sheffield, UK, 6-7 July 2022.
Dhongde, Aniket, Elksne, Maira ORCID: https://orcid.org/0000-0003-2999-3520, Karami, Kaivan
ORCID: https://orcid.org/0000-0002-7530-2922 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
Comparative Study of AlGaN/GaN HEMTs with and without the Buffer on SiC Substrates.
UK Semiconductors 2022, Sheffield, UK, 6-7 July 2022.
Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Dhongde, Aniket, Cheng, Huihua, Reynolds, Paul M.
ORCID: https://orcid.org/0000-0001-7614-0008, Thoms, Stephen
ORCID: https://orcid.org/0000-0001-7820-6023, Reddy, Bojja Aditya, Ritter, Daniel, Li, Chong
ORCID: https://orcid.org/0000-0001-5654-0039 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
Robust sub-100 nm T-gate fabrication process using multi-step development.
MNE EUROSENSORS 2022, Leuven, Belgium, 19-23 September 2022.
Dhongde, Aniket, Taking, Sanna, Elksne, Maira ORCID: https://orcid.org/0000-0003-2999-3520, Ofiare, Afesomeh, Karami, Kaivan
ORCID: https://orcid.org/0000-0002-7530-2922, Dwidar, Mahmud, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
High Performance of AlGaN/GaN HEMTs using Buffer-Free GaN on SiC Structure.
45th WOCSDICE ‐ Workshop on Compound Semiconductor Devices and Integrated Circuits, Ponta Delgada (São Miguel island – Azores), Portugal, 3-6 May 2022.
Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Taking, Sanna, Ofiare, Afesomeh, Elksne, Maira
ORCID: https://orcid.org/0000-0003-2999-3520, Dhongde, Aniket, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
Investigation of Al2O3, Si3N4 and SiO2 Used for Surface Passivation and Gate Dielectric on AlGaN/GaN Metal-Oxide-Semiconductor High Electron Mobility Transistors.
WOCSDICE EXMATEC 2022, Ponta Delgada (São Miguel island–Azores), 3-6 May 2022.
2021
Dhongde, Aniket, Taking, Sanna, Elksne, Maira ORCID: https://orcid.org/0000-0003-2999-3520, Samanta, Swagata
ORCID: https://orcid.org/0000-0003-2943-0189, Ofiare, Afesomeh, Karami, Kaivan
ORCID: https://orcid.org/0000-0002-7530-2922, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
The role of selective pattern etching to improve the Ohmic contact resistance and device performance of AlGaN/GaN HEMTs.
International Journal of Nanoelectronics and Materials, 14,
pp. 21-28.
Ofiare, A., Taking, S., Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Dhongde, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
Investigation of plasma induced etch damage/changes in AlGaN/GaN HEMTs.
International Journal of Nanoelectronics and Materials, 14,
pp. 29-36.
Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Taking, S., Dhongde, A., Ofiare, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
Heavily doped n++ GaN cap layer AlN/GaN metal oxide semiconductor high electron mobility transistor.
International Journal of Nanoelectronics and Materials, 14,
pp. 45-51.
Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Taking, S., Ofiare, A., Dhongde, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
High performance of n++GaN/AlN/GaN high electron mobility transistor.
44th Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe (WOCSDICE), Bristol, UK, 14-17 June 2021.
Articles
Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Dhongde, Aniket, Cheng, Huihua, Reynolds, Paul M.
ORCID: https://orcid.org/0000-0001-7614-0008, Reddy, Bojja Aditya, Ritter, Daniel, Li, Chong
ORCID: https://orcid.org/0000-0001-5654-0039, Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X and Thoms, Stephen
ORCID: https://orcid.org/0000-0001-7820-6023
(2023)
Robust sub-100 nm T-Gate fabrication process using multi-step development.
Micro and Nano Engineering, 19,
100211.
(doi: 10.1016/j.mne.2023.100211)
Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Hassan, S., Taking, S., Ofiare, A., Dhongde, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2023)
Comparative Study of Al2O3 and HfO2 as gate dielectric on AlGaN/GaN MOSHEMTs.
International Journal of Electronics and Communication Engineering, 17(2),
pp. 47-50.
Dhongde, Aniket, Taking, Sanna, Elksne, Maira ORCID: https://orcid.org/0000-0003-2999-3520, Samanta, Swagata
ORCID: https://orcid.org/0000-0003-2943-0189, Ofiare, Afesomeh, Karami, Kaivan
ORCID: https://orcid.org/0000-0002-7530-2922, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
The role of selective pattern etching to improve the Ohmic contact resistance and device performance of AlGaN/GaN HEMTs.
International Journal of Nanoelectronics and Materials, 14,
pp. 21-28.
Ofiare, A., Taking, S., Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Dhongde, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
Investigation of plasma induced etch damage/changes in AlGaN/GaN HEMTs.
International Journal of Nanoelectronics and Materials, 14,
pp. 29-36.
Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Taking, S., Dhongde, A., Ofiare, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
Heavily doped n++ GaN cap layer AlN/GaN metal oxide semiconductor high electron mobility transistor.
International Journal of Nanoelectronics and Materials, 14,
pp. 45-51.
Conference or Workshop Item
Paul, J. et al. (2024) Niobium Quantum Devices: From Fabrication to Measurement. Superconducting Quantum Devices in the UK 2024, London, UK, 18 Jun 2024.
Paul, J. et al. (2024) Development of Superconducting Qubit and Circuit-Components for Advanced Quantum Technologies. Seminar at the National Physical Laboratory, London, UK, 01 Feb 2024.
Paul, J. et al. (2023) Scalable and CMOS-Compatible Superconducting Qubit Fabrication Process for Quantum Computing Applications. Superconducting Qubits and Algorithms Conference (SQA), Munich, Germany, 29 Aug - 01 Sep 2023.
Dhongde, A., Ofiare, A., Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2023)
Buffer-Free GaN-on-SiC HEMTs with Bond Pad Heat Sinks.
UK Semiconductors 2023, Sheffield, UK, 12-13 July 2023.
(Accepted for Publication)
Cheng, Huihua, Dhongde, Aniket, Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Reynolds, Paul
ORCID: https://orcid.org/0000-0001-7614-0008, Thoms, Stephen
ORCID: https://orcid.org/0000-0001-7820-6023, Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X and Li, Chong
ORCID: https://orcid.org/0000-0001-5654-0039
(2022)
Reliable T-gate Process for THz HEMTs.
UK Semiconductors 2022, Sheffield, UK, 6-7 July 2022.
Dhongde, Aniket, Elksne, Maira ORCID: https://orcid.org/0000-0003-2999-3520, Karami, Kaivan
ORCID: https://orcid.org/0000-0002-7530-2922 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
Comparative Study of AlGaN/GaN HEMTs with and without the Buffer on SiC Substrates.
UK Semiconductors 2022, Sheffield, UK, 6-7 July 2022.
Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Dhongde, Aniket, Cheng, Huihua, Reynolds, Paul M.
ORCID: https://orcid.org/0000-0001-7614-0008, Thoms, Stephen
ORCID: https://orcid.org/0000-0001-7820-6023, Reddy, Bojja Aditya, Ritter, Daniel, Li, Chong
ORCID: https://orcid.org/0000-0001-5654-0039 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
Robust sub-100 nm T-gate fabrication process using multi-step development.
MNE EUROSENSORS 2022, Leuven, Belgium, 19-23 September 2022.
Dhongde, Aniket, Taking, Sanna, Elksne, Maira ORCID: https://orcid.org/0000-0003-2999-3520, Ofiare, Afesomeh, Karami, Kaivan
ORCID: https://orcid.org/0000-0002-7530-2922, Dwidar, Mahmud, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
High Performance of AlGaN/GaN HEMTs using Buffer-Free GaN on SiC Structure.
45th WOCSDICE ‐ Workshop on Compound Semiconductor Devices and Integrated Circuits, Ponta Delgada (São Miguel island – Azores), Portugal, 3-6 May 2022.
Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Taking, Sanna, Ofiare, Afesomeh, Elksne, Maira
ORCID: https://orcid.org/0000-0003-2999-3520, Dhongde, Aniket, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
Investigation of Al2O3, Si3N4 and SiO2 Used for Surface Passivation and Gate Dielectric on AlGaN/GaN Metal-Oxide-Semiconductor High Electron Mobility Transistors.
WOCSDICE EXMATEC 2022, Ponta Delgada (São Miguel island–Azores), 3-6 May 2022.
Karami, K. ORCID: https://orcid.org/0000-0002-7530-2922, Taking, S., Ofiare, A., Dhongde, A., Al-Khalidi, A.
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, E.
ORCID: https://orcid.org/0000-0001-5014-342X
(2021)
High performance of n++GaN/AlN/GaN high electron mobility transistor.
44th Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe (WOCSDICE), Bristol, UK, 14-17 June 2021.
Conference Proceedings
Dhongde, Aniket, Taking, Sanna, Ofiare, Afesomeh, Karami, Kaivan ORCID: https://orcid.org/0000-0002-7530-2922, Elksne, Maira, Dwidar, Mahmud, Al-Khalidi, Abdullah
ORCID: https://orcid.org/0000-0003-3739-1204 and Wasige, Edward
ORCID: https://orcid.org/0000-0001-5014-342X
(2022)
DC and RF Characteristics of Buffer-Free AlGaN/GaN HEMT and MIS-HEMTs Using Si3N4 Passivated Mesa-Sidewall.
In: International Conference on Electronic and Photonic Integrated Circuits (EPIC- 2022), Andhra Pradesh, India, 15-17 Dec 2022,
(Accepted for Publication)