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telephone:
01413306007
email:
Lesley.Donaldson@glasgow.ac.uk
James Watt Nanofabrication Center, James Watt South Building, University Avenue, Glasgow G12 8QQ
Burt, D. P., Dobson, P. S. , Donaldson, L. and Weaver, J. M. R. (2008) A simple method for high yield fabrication of sharp silicon tips. Microelectronic Engineering, 85(3), pp. 625-630. (doi: 10.1016/j.mee.2007.11.010)
Cao, X. et al. (2005) Low damage sputter deposition of tungsten for decanano compound semiconductor transistors. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 23(6), pp. 3138-3142. (doi: 10.1116/1.2127937)
Zhou, H., Chong, B.K., Stopford, P., Mills, G., Midha, A., Donaldson, L. and Weaver, J. (2000) Lithographically defined nano and micro sensors using "float coating" of resist and electron beam lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(6), pp. 3594-3599. (doi: 10.1116/1.1321271)
Burt, D. P., Dobson, P. S. , Donaldson, L. and Weaver, J. M. R. (2008) A simple method for high yield fabrication of sharp silicon tips. Microelectronic Engineering, 85(3), pp. 625-630. (doi: 10.1016/j.mee.2007.11.010)
Cao, X. et al. (2005) Low damage sputter deposition of tungsten for decanano compound semiconductor transistors. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 23(6), pp. 3138-3142. (doi: 10.1116/1.2127937)
Zhou, H., Chong, B.K., Stopford, P., Mills, G., Midha, A., Donaldson, L. and Weaver, J. (2000) Lithographically defined nano and micro sensors using "float coating" of resist and electron beam lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18(6), pp. 3594-3599. (doi: 10.1116/1.1321271)