Research Background

Research Background


Here is an excellent presentation given by Dr. Kirsten Moselund about the technology behind the project. 


Wurtzite InP Microdisks: from Epitaxy to Room-Temperature Lasing

Philipp Staudinger, Svenja Mauthe, Noelia Vico Triviño, Steffen Reidt, Kirsten E. Moselund, Heinz Schmid

arXiv:2004.10677v1 [] 22 Apr 2020


Exploring the Size Limitations of Wurtzite III–V Film Growth

Philipp Staudinger, Kirsten E. Moselund, Heinz Schmid

Nano Lett. 20(1), 686-693, 2020


InGaAs FinFETs Directly Integrated on Silicon by Selective Growth in Oxide Cavities

C. Convertino, C. Zota, H. Schmid, D. Caimi, M. Sousa, K. Moselund, L. Czornomaz

Materials 12 (1), 87, 2019


Concurrent Zinc-Blende and Wurtzite Film Formation by Selection of Confined Growth Planes

Philipp Staudinger, Svenja Mauthe, Kirsten E. Moselund, Heinz Schmid

Nano Letters 18 (12), 7856-7862, 2018


III-V heterostructure tunnel field-effect transistor

C. Convertino, C. Zota, H. Schmid, A. Ionescu, K. Moselund

Journal of Physics: Condensed Matter 30 (26), 264005, IOP Publishing, 2018