Focused Electron Beam Induced Processing (FEBIP) refers to a set of additive manufacturing techniques that exploit focused electron beams for advanced patterning at the nanoscale.

Thanks to key recent advances in the field, these techniques are now able to directly write nanoscale objects formed by a wide range of materials.

The current bottlenecks faced by standard lithography methods make FEBIP a particularly promising approach to investigate new phenomena at the nanoscale. The technique’s ability to directly write nanoscale deposits on almost any substrate and its unique capability to create 3D nanostructures is also attracting strong interest from some specialised industries.

The workshop will focus on a wide range of topics related to FEBIP, including: 

  • FEBIP fundamentals: electron-matter interactions, gas dynamics, new precursors, continuum model, Monte Carlo simulations. 
  • New FEBIP processes and materials: purification, hybrid methods involving other deposition techniques (ALD, PVD, CVD…), induced-etching processes.
  • 3D nanofabrication: new computational tools, challenges, symbiosis with other lithography methods.
  • Focused ion beam induced processing.
  • Applications: Magnetism, superconductivity, physics of granular media, actuators, scanning probe microscopy.

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