2025

Finch, John H. ORCID: https://orcid.org/0000-0003-2480-8541, Li, Xiang and Anderson, Erika (2025) Systems in the Making: The Role of Companies in Implementing Sustainability Policy and Reporting. Discussion Paper. University of Glasgow and University of Strathclyde. (doi: 10.36399/gla.pubs.342905).

Milne, Gemma ORCID: https://orcid.org/0000-0003-3426-0516 and Li, Xiang (2025) Shifting the skills conversation: building a lifelong learning culture to foster innovation in Scotland’s financial sector. Discussion Paper. University of Glasgow and University of Strathclyde.

2010

Li, X., Bentley, S., McLelland, H., Holland, M., Zhou, H., Thoms, S. ORCID: https://orcid.org/0000-0001-7820-6023, Macintyre, D.S. and Thayne, I. ORCID: https://orcid.org/0000-0002-9197-5393 (2010) Low damage fully self-aligned replacement gate process for fabricating deep sub-100 nm gate length GaAs metal-oxide-semiconductor field-effect transistors. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 28(6), (doi: 10.1116/1.3501355)

2008

McCahill, Angela, Campbell, Lachlan, McSorley, Theresa, Lynch, Martin J., Li, Xiang, Yang, Cheng, Baillie, George S. ORCID: https://orcid.org/0000-0003-2469-6316, Houslay, Miles D. and Sood, Arvind (2008) In cardiac myocytes, cAMP elevation triggers the down-regulation of transcripts and promoter activity for cyclic AMP phosphodiesterase-4A10 (PDE4A10). Cellular Signalling, 20(11), pp. 2071-2083. (doi: 10.1016/j.cellsig.2008.07.017)

2006

Li, X, Zhou, H, Hill, R, Wilkinson, CDW and Thayne, IG (2006) Dry etching of a device quality high-k GaxGdyOz oxide in CH4/H2-O2 chemistry for the fabrication of III-V MOSFETs. In: 32nd International Conference on Micro-and Nano-Engineering 2006, Barcelona, Spain,

2005

Li, X, Cao, X, Zhou, H, Wilkinson, CDW, Thoms, S, Macintyre, DS, Holland, MC and Thayne, IG (2005) A low damage RIE process for the fabrication of cmpound semiconductor based transistors wtih sub-100nm tungsten gates. In: 31st International Conference on Micro and Nano-Engineering 2005, Vienna, Austria,

2004

Li, X, Elgaid, K, McLelland, H and Thayne, IG (2004) Surface mass spectrometric analysis of SiCl4/SiF4/O2 dry-etch gate recessed 120nm T-gate HEMTs. In: Microelectronic and Nanoelectronic Engineering 2004, Rotterdam, The Netherlands,

Articles

Li, X., Bentley, S., McLelland, H., Holland, M., Zhou, H., Thoms, S. ORCID: https://orcid.org/0000-0001-7820-6023, Macintyre, D.S. and Thayne, I. ORCID: https://orcid.org/0000-0002-9197-5393 (2010) Low damage fully self-aligned replacement gate process for fabricating deep sub-100 nm gate length GaAs metal-oxide-semiconductor field-effect transistors. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 28(6), (doi: 10.1116/1.3501355)

McCahill, Angela, Campbell, Lachlan, McSorley, Theresa, Lynch, Martin J., Li, Xiang, Yang, Cheng, Baillie, George S. ORCID: https://orcid.org/0000-0003-2469-6316, Houslay, Miles D. and Sood, Arvind (2008) In cardiac myocytes, cAMP elevation triggers the down-regulation of transcripts and promoter activity for cyclic AMP phosphodiesterase-4A10 (PDE4A10). Cellular Signalling, 20(11), pp. 2071-2083. (doi: 10.1016/j.cellsig.2008.07.017)

Research Reports or Papers

Finch, John H. ORCID: https://orcid.org/0000-0003-2480-8541, Li, Xiang and Anderson, Erika (2025) Systems in the Making: The Role of Companies in Implementing Sustainability Policy and Reporting. Discussion Paper. University of Glasgow and University of Strathclyde. (doi: 10.36399/gla.pubs.342905).

Milne, Gemma ORCID: https://orcid.org/0000-0003-3426-0516 and Li, Xiang (2025) Shifting the skills conversation: building a lifelong learning culture to foster innovation in Scotland’s financial sector. Discussion Paper. University of Glasgow and University of Strathclyde.

Conference Proceedings

Li, X, Zhou, H, Hill, R, Wilkinson, CDW and Thayne, IG (2006) Dry etching of a device quality high-k GaxGdyOz oxide in CH4/H2-O2 chemistry for the fabrication of III-V MOSFETs. In: 32nd International Conference on Micro-and Nano-Engineering 2006, Barcelona, Spain,

Li, X, Cao, X, Zhou, H, Wilkinson, CDW, Thoms, S, Macintyre, DS, Holland, MC and Thayne, IG (2005) A low damage RIE process for the fabrication of cmpound semiconductor based transistors wtih sub-100nm tungsten gates. In: 31st International Conference on Micro and Nano-Engineering 2005, Vienna, Austria,

Li, X, Elgaid, K, McLelland, H and Thayne, IG (2004) Surface mass spectrometric analysis of SiCl4/SiF4/O2 dry-etch gate recessed 120nm T-gate HEMTs. In: Microelectronic and Nanoelectronic Engineering 2004, Rotterdam, The Netherlands,