Course Catalogue

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-- This course provides an introduction and fabrication process (such as photolithography and electron-beam lithography system) of Micro- and nanotechnology.

-- The technologies contribute to the design, characterization, manufacture and production, systems and devices by controlling size at the nanometre scale that are very small in size (cheaper, lighter and faster devices).

-- The big contribution of Moore's law in scaling process, which states that the number of transistors on a microchip doubles about every two years.

-- This course also describes about mask manufacturing, CAD design, introducing microscopies, cleanrooms, cleanliness and cleanroom safety protocols, different instruments in cleanroom, familiar with chemical solvents etc., preparing devices like PN junction diode, bipolar transistor (PNP or NPN).

The course will be timetabled in blocks

Mandatory Entry Requirements

None

Recommended Entry Requirements

None

None.

None.

75% final Examination

25% Writing experimental report based on CAD design (such as p-n junction diode, bipolar transistors etc. ), Preparing devices using Photolithography (PL) process including experimental principle, process, and device measurement result and analysis

This course aims to:

■ introduce students to the historical development and present importance of micro- and nano-fabrication technologies;

■ apply and evaluate a clear qualitative, quantitative and practical understanding of the key industrial processes used in micro- and nano-fabrication, and the physical principles underpinning these processes;

■ develop students' abilities to predict the outcomes of fabrication processes in the creation of practical microelectronic devices, and then measure, analyse and optimise fabrication flows.

■ create or make design or pattern of mask using computer-aided design (CAD) systems in Photolithography. Masks are typically made from glass covered with chromium or iron oxide.

By the end of this course students will be able to:

■ apply and explain the physical and chemical processes underpinning key fabrication techniques. (including lithography, oxidation, epitaxy, chemical mechanical polishing, metallization, diffusion, ion implantation, dry etching);

■ Contrast optical and other lithographic systems, illustrating the use of positive and negative resists;

■ Design masks for lithography, using standard CAD tools;

■ calculate processing parameters for oxidation, epitaxy, diffusion, implantation and etch, to predict the results of processes analytically;

■ diagnose processing problems from micrographs and electrical measurements, and present conclusions effectively to experienced practitioners;

■ apply the methods of dry-etching and wet-etching; Explain the principles of design of experiments in optimizing fabrication processes; 

■ understand aspects of health and safety associated with cleanroom fabrication and economic, environmental and social impacts of micro- and nano-fabrication in the present and near future, based on sound understanding of technical practicalities.

■ operate the different types of microscopes, such as SEM, AFM, TEM, and STM