Postgraduate taught 

Nanoscience & Nanotechnology MSc

Micro & Nano Technology ENG5055

  • Academic Session: 2019-20
  • School: School of Engineering
  • Credits: 20
  • Level: Level 5 (SCQF level 11)
  • Typically Offered: Semester 2
  • Available to Visiting Students: Yes

Short Description

This course examines the impact of fabrication processes on the characteristics of diodes and MOS capacitors. Topics include silicon oxidation; chemical mechanical polishing, silicon epitaxy and metallisation; diffusion and ion implantation; large scale production techniques; measurement of device parameters; mask design; dry etching; simulation of integrated processes; use of design of experimental methodology..

Timetable

Weekly

Thursday 9am - 1pm

Requirements of Entry

None.

Excluded Courses

None.

Co-requisites

None.

Assessment

Degree Examination

Assignments

Main Assessment In: April/May

Course Aims

Description of course

10 integrated lecture and laboratory sessions of approximately 4 hours duration

Aims

To introduce students to the technology of micro- and nano-fabrication.

Objectives

Understanding

Appreciation of the importance and historical development of silicon circuit manufacture. Understanding of the physical principles determining the fabrication processes. How processes are combined to create a device.

Knowledge

Use of positive and negative resists; exposure systems; silicon oxidation and metallisation; methods of diffusion and ion implantation, plant organisation and quality control; use and methods of dry etching.

Skills

Ability to outline design masks. Measure device parameters. Design process with other technologies than MOSFETs. Use of LEdit. Written presentation skills.

Syllabus

General impact of silicon; optical lithography other lithographic systems; fabrication procedures for diodes and MOS capacitors; silicon oxidation; chemical mechanical polishing, silicon epitaxy and metallisation; diffusion and ion implantation; large scale production techniques; measurement of device parameters; mask design; dry etching; simulation of integrated processes; use of design of experiments methodology. Designing processes from scratch.

Intended Learning Outcomes of Course

By the end of this course students will be able to:

.

Minimum Requirement for Award of Credits

Requirements for the award of credits

To ensure that a student will be awarded the credits for a course, he or she must complete the course and reach a minimum level of attainment. This requires that a student:

■ be present at lectures, laboratories and tutorials on at least 50% of occasions at which attendance is monitored,

■ satisfactorily complete the assignments in the laboratories,

■ attend the class test (if held) and gain a nonzero mark and

■ attend the degree examination and gain a nonzero mark

Note that these are minimum requirements: good students will achieve far higher partici-pa-tion rates. Any student who misses an assessment or a significant number of classes because of illness or other good cause should report this by completing a Websurf absence report.